Instant plasma generator
Gain microsecond-level control of the RF source waveform with the instant plasma generator.
Prodrive Technologies introduces technology that replaces solid-state and mechanical matchboxes challenged by varying plasma load conditions.
The instant plasma generator expands control over plasma conditions for atomic-scale plasma etch and deposition processing. It supports wafer ignition and stabilization through high-speed pulsing and near-arbitrary envelope control while maintaining accurate power delivery.
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No matchbox or frequency tuning needed
Eliminates the use of slow and unprecise matching techniques such as variable components or frequency tuning.
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No frequency tuning required
Saves installation, setup and matching time.
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Microsecond-level output power settling
Control the plasma near real-time, microseconds.
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Advanced control mechanism
The generator control is optimized for use with plasma loads.
Features
- Microsecond-level waveform control
- Integrated IV sensor
- Dynamic high speed (multi-level) pulsing
- Multiple output control modes
- Programmable (locked) phase
- Common exciter synchronization (CEX)
- EtherCAT
- DC-bias measurement support
- Arc management support
Benefits
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Improved process control
Microsecond-level control ensures that processes run stable and provide optimal diagnostics.
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Reduced system complexity
Remove matchboxes, matchbox controllers and other external sensors by using a single box solution.
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Reduce process drift
Reduce process drift with very fast and stable RF generation with integrated sensors.
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Enhanced system efficiency
By optimized the effiency with fewer inbetween components, the system efficiency is enhanced.
Application Areas
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Plasma deposition
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Plasma etching
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Flat Panel Display processing
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Plasma Cleaning
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Plasma Dicing
Market & Industries
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Semiconductor
Advanced solutions for motion control, image and big data processing
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Flat panel display
Components and solutions for LED, DLP, plasma and LCD displays
Product specifications
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